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The Photomask Inspection Equipment market Research report clarifies the past experience and trends, on the basis of these past experiences, it offers the future prediction considering other factors influencing the growth rate. This worldwide report offers the detailed analysis of the important factors such as market dynamics (DROT), PEST, and PORTER which assists the growth of the Photomask Inspection Equipment Industry. These past experience and factors assist to build the strategy and future planning of Photomask Inspection Equipment Market and hold a place in the competitive world.
The Photomask Inspection Equipment industry Market report offers the competitive scenario in the Photomask Inspection Equipment industry based on the type of product, applications, and the companies that are present in the Photomask Inspection Equipment market, and covers the company profiles, their development policies, lined up products and recent launched along with the SWOT analysis of companies.
This report studies the global Photomask Inspection Equipment market status and forecast, categorizes the global Photomask Inspection Equipment market size (value & volume) by manufacturers, type, application, and region. This report focuses on the top manufacturers in North America, Europe, Japan, China, India, Southeast Asia and other regions (Central & South America, and Middle East & Africa).
Photomask Inspection Equipment is fab equipment that is used, before lithography, to inspect photomasks for defects during the production of semiconductor wafers. It is also used for R&D purposes. The increase in the application of semiconductor integrated circuits (ICs) in segments like consumer electronics, automobiles, and industries is prompting IC vendors to raise their production scales. This will compel the vendors to demand more Photomask Inspection Equipment to ensure maximum reliability of their offerings.
The semiconductor market is shifting toward complex and miniaturized devices. Semiconductor device manufacturers need higher inspection sensitivity as they move toward lower node sizes (10nm and beyond). The migration will introduce complex structures and designs, as well as new materials.
Broadly speaking, we believe there are three factors that affect sales of Mask Inspection Systems: (1) growth in the number of mask layers in tandem with the shift to finer process rules; (2) investment timing by leading-edge logic foundries (3) investment by mask shops.
The global Photomask Inspection Equipment market is valued at xx million US$ in 2017 and will reach xx million US$ by the end of 2025, growing at a CAGR of xx% during 2018-2025.
The major manufacturers covered in this report
    KLA-Tencor
    Applied Materials
    Lasertec
    Carl Zeiss
    ASML (HMI)
    ...
Geographically, this report studies the top producers and consumers, focuses on product capacity, production, value, consumption, market share and growth opportunity in these key regions, covering
    North America
    Europe
    China
    Japan
    India
    Southeast Asia
    Other regions (Central & South America, Middle East & Africa)
The study objectives of this report are:

    To study and analyze the global Photomask Inspection Equipment market size (value & volume) by company, key regions/countries, products and application, history data from 2013 to 2017, and forecast to 2025.
    To understand the structure of Photomask Inspection Equipment market by identifying its various subsegments.
    To share detailed information about the key factors influencing the growth of the market (growth potential, opportunities, drivers, industry-specific challenges and risks).
    Focuses on the key global Photomask Inspection Equipment manufacturers, to define, describe and analyze the sales volume, value, market share, market competition landscape, SWOT analysis and development plans in next few years.
    To analyze the Photomask Inspection Equipment with respect to individual growth trends, future prospects, and their contribution to the total market.
    To project the value and volume of Photomask Inspection Equipment submarkets, with respect to key regions (along with their respective key countries).
    To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market.
    To strategically profile the key players and comprehensively analyze their growth strategies.
In this study, the years considered to estimate the market size of Photomask Inspection Equipment are as follows:
    History Year: 2013-2017
    Base Year: 2017
    Estimated Year: 2018
    Forecast Year 2018 to 2025
This report includes the estimation of market size for value (million USD) and volume (K Units). Both top-down and bottom-up approaches have been used to estimate and validate the market size of Photomask Inspection Equipment market, to estimate the size of various other dependent submarkets in the overall market. Key players in the market have been identified through secondary research, and their market shares have been determined through primary and secondary research. All percentage shares, splits, and breakdowns have been determined using secondary sources and verified primary sources.
For the data information by region, company, type and application, 2017 is considered as the base year. Whenever data information was unavailable for the base year, the prior year has been considered.
Key Stakeholders
Raw material suppliers
分销商/贸易商/批发商/供应商
监管机构,包括政府机构和非政府组织
商业研发(R&D)机构
进口商和出口商
政府组织,研究机构和咨询公司
行业协会和行业机构
终端使用行业
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详细分析和分析其他市场参与者。
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公司名称:QYResearch CO。,LIMITED |专注于市场调查和研究
蒂娜|销售经理
电话:0086-20-22093278(CN)
 
 
 

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